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(a) (b) (c) 37 A Figure 5.1 HRTEM of (a) as-deposited ZrSix Oy , (b) furnace annealed (1100o C), and (c) 180 s RTA (1050ºC) annealed ZrSix Oy prior to etching. Complete crystallization is observed after RTA anneal. layer at the Si interface is evident in the as-deposited Zr silicate film (Fig 5.1(a)). The 123
